UEFC-5700 - VACTEC GmbH

Temescal UEFC-5700 Deposition System

The Temescal UEFC-570 with Auratus represents Temescal ultimate high-throughput
plattform for lift-off orientazed evaporation. This system is designed to support the
metalization of 42 -150mmm wafers per load via high capacity e-beam evaporation.

The load locked product chamber can be pumped by as many as two dedicated, high
throughput 16-in cryogenic pumps. Dual-cryopumps make it possible to pump this
large chamber in 10 min from atmosphere to pressures in the range of 10E-7.
During wafer exchanges, the source chamber is maintained at high vacuum by the
independent pumping of dedicated 10-in cryopump.


Standard Features
System Control
-Temescal Control System (TCS), providing Auto, Manual, and Service modes plus 

 process datalogging
-Security code-based access for multiple classes of users
-TCS-based process variable monitoring (PVM), allowing user to set tolerance 

 alarms for critical process variables
-Inficon XTC/3 deposition controller 

E-Beam
-Temescal 4- or 6-pocket PopTop turret source
-Temescal CV-12SLX (12 kW) electron beam power supply
-Temescal SuperSweep64 programmable beam sweep controller